Detection of high mass cluster ions sputtered from Bi surfaces

  • A. Shepard
  • , R. W. Hewitt
  • , G. J. Slusser
  • , W. E. Baitinger
  • , R. G. Cooks
  • , N. Winograd
  • , W. N. Delgass
  • , A. Varon
  • , G. Devant

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

The technique of secondary ion mass spectrometry (SIMS) has been employed to detect Bi+3 ions and associated oxides Bi3O+x (x ≈ 1 to 4) from a Bi foil. Using a 3 keV Ar+ ion primary beam of 5 × 10-7 A/cm2, mass resolution to nearly 700 with the requisite sensitivity has been achieved. The Bi surface was also monitored by X-ray photoelectron spectroscopy (XPS or ESCA). The presence of a weak O 1s peak at 532.7 eV and a strong SIMS Bi+3 peak is interpreted to mean that the oxygen is weakly incorporated into the Bi lattice without disrupting metalmetal bonds.

Original languageEnglish (US)
Pages (from-to)371-373
Number of pages3
JournalChemical Physics Letters
Volume44
Issue number2
DOIs
StatePublished - Dec 1 1976

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy
  • Physical and Theoretical Chemistry

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