Abstract
We report on the detection of a zero-field spin dependent current response in Si based metal-oxide-semiconducting field-effect transistors. We argue that this phenomenon results from spin dependent recombination (SDR) due to the mixing of the energy levels involved in the singlet and triplet pairs which form prior to recombination involving Pb centers at the Si/SiO 2 interface. We demonstrate a very strong correlation between the zero-field response, the low-field magnetic resonant response, and electrical gated current interface trap measurement. Our results provide strong evidence that previous magnetoresistance measurements made in silicon devices arise from deep level defects that cause SDR.
Original language | English (US) |
---|---|
Article number | 053506 |
Journal | Applied Physics Letters |
Volume | 103 |
Issue number | 5 |
DOIs | |
State | Published - Jul 29 2013 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)