Determining the oxidation stability of SnSe under atmospheric exposure

Jonathan R. Chin, Bonnie G. Gardner, Marshall B. Frye, Derrick S.H. Liu, Sebastian A. Marini, Jeffrey Shallenberger, Matthew T. McDowell, Maria Hilse, Stephanie Law, Lauren M. Garten

Research output: Contribution to journalArticlepeer-review

Abstract

Understanding surface stability becomes critical as 2D materials like SnSe are developed for piezoelectric and optical applications. SnSe thin films deposited by molecular beam epitaxy showed no structural changes after a two-year exposure to atmosphere, as confirmed by X-ray diffraction and Raman spectroscopy. X-ray photoelectron spectroscopy and reflectivity show a stable 3.5 nm surface oxide layer, indicating a self-arresting oxidative process. Resistivity measurements show an electrical response dominated by SnSe post-exposure. This work shows that SnSe films can be used in ambient conditions with minimal risk of long-term degradation, which is critical for the development of piezoelectric or photovoltaic devices. Graphical Abstract: (Figure presented.)

Original languageEnglish (US)
Pages (from-to)1000-1006
Number of pages7
JournalMRS Communications
Volume14
Issue number5
DOIs
StatePublished - Oct 2024

All Science Journal Classification (ASJC) codes

  • General Materials Science

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