Keyphrases
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Dielectric Function
100%
Si1-xGex
100%
Optical Functions
100%
Silane
66%
Surface Diffusion
66%
Temperature Measurement
33%
In Situ
33%
Short-range Order
33%
Material Properties
33%
Electrode Configuration
33%
Spectroscopic Ellipsometry
33%
Optical Properties
33%
A-Si
33%
Post Deposition
33%
Real Time Spectroscopic Ellipsometry
33%
Operating Temperature
33%
Quantum Efficiency
33%
Spectroscopic Measurement
33%
Real-time Control
33%
Solar Cell
33%
Deposition Parameters
33%
Chemical Vapor Deposition Processes
33%
Surface Contamination
33%
Deposited Film
33%
Flow Ratio
33%
Multijunction
33%
Dilution Ratio
33%
Alloy Content
33%
Amorphous Silicon Germanium
33%
Silicon-germanium Alloy
33%
Advanced Models
33%
GeH4
33%
H2O Dilution
33%
Diffusion Characteristics
33%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Dielectric Function
100%
Energy Engineering
33%
Quantum Efficiency
33%
Deposited Film
33%
Operating Temperature
33%
Dilution
33%
Deposition Process
33%
Deposition Parameter
33%
Based Solar Cell
33%
Surface Contamination
33%
Performed Measurement
33%
Material Science
Dielectric Material
100%
Plasma-Enhanced Chemical Vapor Deposition
100%
Film
66%
Surface Diffusion
66%
Materials Property
33%
Optical Property
33%
Amorphous Silicon
33%
Solar Cell
33%
Dilution
33%
Vapor Phase Deposition
33%
Si-Ge Alloys
33%
Chemical Engineering
Plasma Enhanced Chemical Vapor Deposition
100%
Spectroscopic Ellipsometry
66%
Surface Diffusion
66%