Direct fabrication of two-dimensional titania arrays using interference photolithography

Atsushi Shishido; Ivan B. Diviliansky; I. C. Khoo; Theresa S. Mayer; Suzushi Nishimura; Gina L. Egan; Thomas E. Mallouk

doi:10.1063/1.1415417

Direct fabrication of two-dimensional titania arrays using interference photolithography

Atsushi Shishido, Ivan B. Diviliansky, I. C. Khoo, Theresa S. Mayer, Suzushi Nishimura, Gina L. Egan, Thomas E. Mallouk

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Abstract

Two-dimensional (2D) titania arrays with periods of 0.8-2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium-aluminum-garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.

Original language	English (US)
Pages (from-to)	3332-3334
Number of pages	3
Journal	Applied Physics Letters
Volume	79
Issue number	20
DOIs	https://doi.org/10.1063/1.1415417
State	Published - Nov 12 2001

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.1415417

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title = "Direct fabrication of two-dimensional titania arrays using interference photolithography",

abstract = "Two-dimensional (2D) titania arrays with periods of 0.8-2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium-aluminum-garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.",

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T1 - Direct fabrication of two-dimensional titania arrays using interference photolithography

AU - Shishido, Atsushi

AU - Diviliansky, Ivan B.

AU - Khoo, I. C.

AU - Mayer, Theresa S.

AU - Nishimura, Suzushi

AU - Egan, Gina L.

AU - Mallouk, Thomas E.

PY - 2001/11/12

Y1 - 2001/11/12

N2 - Two-dimensional (2D) titania arrays with periods of 0.8-2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium-aluminum-garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.

AB - Two-dimensional (2D) titania arrays with periods of 0.8-2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium-aluminum-garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.

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Direct fabrication of two-dimensional titania arrays using interference photolithography

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