Direct growth of monolayer 1T–2H MoS₂ heterostructures using KCl-assisted CVD process

Keyphrases

• Direct Growth 100%
• CVD Process 100%
• MoS2/WS2 Heterojunction 100%
• 2H Phase 100%
• Sodium Chloride 66%
• Atmospheric Pressure Chemical Vapor Deposition (APCVD) 66%
• MoS2 Monolayer 66%
• Chemical Vapor Deposition Growth 66%
• Metastable Phase 66%
• High-resolution Scanning 33%
• Resonance Raman 33%
• Scanning Transmission Electron Microscope 33%
• Molybdenite 33%
• Chemical State 33%
• Phase Structure 33%
• Structural Properties 33%
• X-ray Photoemission Spectroscopy 33%
• Polymorphism 33%
• Layered Transition Metal Dichalcogenides 33%
• Emission Properties 33%
• Growth Strategy 33%
• Flakes 33%
• Photoluminescence Emission 33%
• Raman Bands 33%
• Atomically Thin Transition Metal Dichalcogenides 33%
• Deposition Temperature 33%
• Micrometer Size 33%
• Polytype 33%
• Direct Synthesis 33%
• Atomic Arrangement 33%
• Spectroscopy Raman 33%
• Device Integration 33%
• Anion Intercalation 33%
• Intercalation-exfoliation 33%
• Raman Studies 33%
• Transmission Electron Microscope Imaging 33%
• 1T Phase 33%
• Growth Outcomes 33%
• 1T-MoS2 33%
• Bottom-up Growth 33%
• CRISTAL 33%
• Phase Domain 33%

Material Science

• Monolayers 100%
• Chemical Vapor Deposition 100%
• Heterojunction 100%
• Transition Metal Dichalcogenide 50%
• Alkali Metal 50%
• Metal Halide 50%
• Photoluminescence 25%
• Chemical State 25%
• Phase Structure 25%
• Structural Property 25%
• X-Ray Photoelectron Spectroscopy 25%
• Device Integration 25%