TY - JOUR
T1 - Direct Imaging of the Relaxation of Individual Ferroelectric Interfaces in a Tensile-Strained Film
AU - Li, Linglong
AU - Cao, Ye
AU - Somnath, Suhas
AU - Yang, Yaodong
AU - Jesse, Stephen
AU - Ehara, Yoshitaka
AU - Funakubo, Hiroshi
AU - Chen, Long Qing
AU - Kalinin, Sergei V.
AU - Vasudevan, Rama K.
N1 - Funding Information:
This research was sponsored by the Division of Materials Sciences and Engineering, BES, DOE (R.K.V., Y.C., S.S., S.V.K.) and JSPS KAKENHI Grant Nos. 15H04121 and 26220907 (H.F.). Research was conducted at the Center for Nanophase Materials Sciences, which also provided support (S.J.) and is a DOE Office of Science User Facility. L.L. acknowledges financial support from Chinese Scholarship Council. Supports from Natural Science Foundation of China (Grant Nos. 51431007 and 51321003) and MOE innovation team (Grant No. IRT13034) are also acknowledged. LQC was supported by the US DOE, Office of Basic Energy Sciences, Materials Sciences and Engineering Division, under Award No. DE-FG02-07ER46417.
Publisher Copyright:
© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2017/4/1
Y1 - 2017/4/1
N2 - Understanding the dynamic behavior of interfaces in ferroic materials is an important field of research with widespread practical implications, as the motion of domain walls and phase boundaries are associated with substantial increases in dielectric and piezoelectric effects. Although commonly studied in the macroscopic regime, the local dynamics of interfaces have received less attention, with most studies limited to domain growth and/or reversal by piezoresponse force microscopy (PFM). Here, spatial mapping of local domain wall-related relaxation in a tensile-strained PbTiO3 thin film using time-resolved band-excitation PFM is demonstrated, which allows exploring of the field-induced strain (piezoresponse) as a function of applied voltage and time. Through multivariate statistical analysis on the resultant 4-dimensional dataset (x,y,V,t) with functional fitting, it is determined that the relaxation is strongly correleated with the distance to the domain walls, and varies based on the type of domain wall present in the probed volume. Phase-field modeling shows the relaxation behavior near and away from the interfaces, and confirms the modulation of the z-component of polarization by wall motion, yielding the observed piezoresponse relaxation. These studies shed light on the local dynamics of interfaces in ferroelectric thin films, and are therefore important for the design of ferroelectric-based components in microelectromechanical systems.
AB - Understanding the dynamic behavior of interfaces in ferroic materials is an important field of research with widespread practical implications, as the motion of domain walls and phase boundaries are associated with substantial increases in dielectric and piezoelectric effects. Although commonly studied in the macroscopic regime, the local dynamics of interfaces have received less attention, with most studies limited to domain growth and/or reversal by piezoresponse force microscopy (PFM). Here, spatial mapping of local domain wall-related relaxation in a tensile-strained PbTiO3 thin film using time-resolved band-excitation PFM is demonstrated, which allows exploring of the field-induced strain (piezoresponse) as a function of applied voltage and time. Through multivariate statistical analysis on the resultant 4-dimensional dataset (x,y,V,t) with functional fitting, it is determined that the relaxation is strongly correleated with the distance to the domain walls, and varies based on the type of domain wall present in the probed volume. Phase-field modeling shows the relaxation behavior near and away from the interfaces, and confirms the modulation of the z-component of polarization by wall motion, yielding the observed piezoresponse relaxation. These studies shed light on the local dynamics of interfaces in ferroelectric thin films, and are therefore important for the design of ferroelectric-based components in microelectromechanical systems.
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U2 - 10.1002/aelm.201600508
DO - 10.1002/aelm.201600508
M3 - Article
AN - SCOPUS:85015212178
SN - 2199-160X
VL - 3
JO - Advanced Electronic Materials
JF - Advanced Electronic Materials
IS - 4
M1 - 1600508
ER -