@inproceedings{9c1a0397836f44879d8398fd0e51c09c,
title = "Direct measurement of the in situ developed latent image: The residual swelling fraction",
abstract = "The spatial distribution of polymer photoresist and deuterium labeled developer highlights a fraction of material at a model line edge that swells, but does not dissolve. This residual swelling fraction remains swollen during both the in situ development and rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. We demonstrate that contrast variant neutron reflectivity provides a general method to probe the nanometer resolved in situ development and rinse process step.",
author = "Prabhu, {Vivek M.} and Vogt, {Bryan D.} and Shuhui Kang and Ashwin Rao and Lin, {Eric K.} and Satija, {Sushil K.} and Karen Turnquest",
year = "2007",
doi = "10.1117/12.712311",
language = "English (US)",
isbn = "0819466387",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
number = "PART 1",
booktitle = "Advances in Resist Materials and Processing Technology XXIV",
edition = "PART 1",
note = "Advances in Resist Materials and Processing Technology XXIV ; Conference date: 26-02-2007 Through 28-02-2007",
}