Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Vivek M. Prabhu; Bryan D. Vogt; Shuhui Kang; Ashwin Rao; Eric K. Lin; Sushil K. Satija

doi:10.1116/1.2800329

Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Eric K. Lin, Sushil K. Satija

Chemical Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.

Original language	English (US)
Pages (from-to)	2514-2520
Number of pages	7
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	25
Issue number	6
DOIs	https://doi.org/10.1116/1.2800329
State	Published - 2007

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2800329

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title = "Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity",

abstract = "The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.",

author = "Prabhu, {Vivek M.} and Vogt, {Bryan D.} and Shuhui Kang and Ashwin Rao and Lin, {Eric K.} and Satija, {Sushil K.}",

note = "Funding Information: This work was supported by SEMATECH under Agreement No. 309841 OF. The authors acknowledge Jim Sounik and Michael Sheehan at DuPont Electronic Polymers for providing the polymers used in this study and Wen-li Wu (NIST) for encouragement throughout this work. Certain commercial equipment and materials are identified in this paper in order to specify adequately the experimental procedure. In no case does such identification imply recommendations by the National Institute of Standards and Technology nor does it imply that the material or equipment identified is necessarily the best available for this purpose.",

year = "2007",

doi = "10.1116/1.2800329",

language = "English (US)",

volume = "25",

pages = "2514--2520",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

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T1 - Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

AU - Prabhu, Vivek M.

AU - Vogt, Bryan D.

AU - Kang, Shuhui

AU - Rao, Ashwin

AU - Lin, Eric K.

AU - Satija, Sushil K.

N1 - Funding Information: This work was supported by SEMATECH under Agreement No. 309841 OF. The authors acknowledge Jim Sounik and Michael Sheehan at DuPont Electronic Polymers for providing the polymers used in this study and Wen-li Wu (NIST) for encouragement throughout this work. Certain commercial equipment and materials are identified in this paper in order to specify adequately the experimental procedure. In no case does such identification imply recommendations by the National Institute of Standards and Technology nor does it imply that the material or equipment identified is necessarily the best available for this purpose.

PY - 2007

Y1 - 2007

N2 - The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.

AB - The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.

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JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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ER -

Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Abstract

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