@article{18f3bf00dd414b7a87490dbf912b5408,
title = "Directed Self-Assembly of Hierarchical Supramolecular Block Copolymer Thin Films on Chemical Patterns",
author = "Wu, \{Guang Peng\} and Xiaoying Liu and Xuanxuan Chen and Suh, \{Hyo Seon\} and Xiao Li and Jiaxing Ren and Arges, \{Christopher G.\} and Faxue Li and Zhang Jiang and Nealey, \{Paul F.\}",
note = "Funding Information: This work was supported in part by the U.S. Department of Energy, Offi ce of Science, Offi ce of Basic Energy Sciences, at the Materials Science Division, at the Center for Nanoscale Materials; and at the Advanced Photon Source, a U.S. Department of Energy (DOE) Offi ce of Science User Facility operated for the DOE Offi ce of Science, all in Argonne National Laboratory under Contract No. DE-AC02-06CH11357. G.-P. Wu gratefully acknowledges the support of Hundred Talents Program of Zhejiang University from China. The authors thank Dr. S. McBride and Prof. H. M. Jaeger from the Department of Physics and James Franck Institute at the University of Chicago for helpful discussions.",
year = "2016",
month = jul,
day = "8",
doi = "10.1002/admi.201600048",
language = "English (US)",
volume = "3",
journal = "Advanced Materials Interfaces",
issn = "2196-7350",
publisher = "John Wiley and Sons Ltd",
number = "13",
}