Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography

Keyphrases

• Thermal Annealing 100%
• Polystyrene 100%
• Poly(propylene carbonate) 100%
• Directed Self-assembly 100%
• Chemical Pattern 100%
• Block Copolymer 60%
• Thermal Treatment 60%
• Nanofabrication 40%
• Lamellae 40%
• Sub-10 Nm 40%
• Self-assembly Strategy 40%
• Poly(styrene-co-methyl methacrylate) 40%
• High Performance 20%
• Range Order 20%
• Polymeric Materials 20%
• Silicon Substrate 20%
• Rapid Development 20%
• Chemical Modification 20%
• Pattern Transfer 20%
• Industry Standards 20%
• Control Block 20%
• Nanoimprint Lithography 20%
• Orientation Control 20%
• Conventional Photolithography 20%
• Flory-Huggins Interaction Parameter 20%
• Storage Applications 20%
• Etch Selectivity 20%
• Solvent Vapor Annealing 20%
• Topcoat 20%
• Lithography Technology 20%
• Large-area Patterning 20%
• Density multiplication 20%
• Directed Self-assembly of Block Copolymers 20%

Engineering

• Heat Treatment 100%
• Lithography 100%
• Range Order 33%
• Silicon Substrate 33%
• Optical Lithography 33%
• Nanolithography 33%
• Intrinsic Property 33%
• Estimated Value 33%
• Control Block 33%
• Industry Standard 33%
• Nanomanufacturing System 33%
• Pattern Transfer 33%
• Huggins Interaction Parameter 33%
• Nano-Fabrication 33%
• Polymer 33%

Material Science

• Polystyrene 100%
• Self Assembly 100%
• Lithography 100%
• Polypropylene 100%
• Block Copolymer 57%
• Poly Methyl Methacrylate 28%
• Density 14%
• Polymer 14%
• Annealing 14%
• Long-Range Order 14%
• Cylinder 14%
• Silicon Substrate 14%