Domain patterned permalloy incorporated above and below on-chip RF spiral inductors

Vasu Pulijala; Syed Azeemuddin

doi:10.1109/IMaRC.2015.7411428

Domain patterned permalloy incorporated above and below on-chip RF spiral inductors

Vasu Pulijala, Syed Azeemuddin

School of Engineering (Behrend)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.

Original language	English (US)
Title of host publication	IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	373-375
Number of pages	3
ISBN (Electronic)	9781509001569
DOIs	https://doi.org/10.1109/IMaRC.2015.7411428
State	Published - Feb 17 2016
Event	IEEE MTT-S International Microwave and RF Conference, IMaRC 2015 - Hyderabad, India Duration: Dec 10 2015 → Dec 12 2015

Publication series

Name	IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015

Conference

Conference	IEEE MTT-S International Microwave and RF Conference, IMaRC 2015
Country/Territory	India
City	Hyderabad
Period	12/10/15 → 12/12/15

All Science Journal Classification (ASJC) codes

Computer Networks and Communications

Access to Document

10.1109/IMaRC.2015.7411428

Cite this

Pulijala, V., & Azeemuddin, S. (2016). Domain patterned permalloy incorporated above and below on-chip RF spiral inductors. In IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015 (pp. 373-375). Article 7411428 (IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMaRC.2015.7411428

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title = "Domain patterned permalloy incorporated above and below on-chip RF spiral inductors",

abstract = "This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.",

author = "Vasu Pulijala and Syed Azeemuddin",

note = "Publisher Copyright: {\textcopyright} 2015 IEEE.; IEEE MTT-S International Microwave and RF Conference, IMaRC 2015 ; Conference date: 10-12-2015 Through 12-12-2015",

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Pulijala, V & Azeemuddin, S 2016, Domain patterned permalloy incorporated above and below on-chip RF spiral inductors. in IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015., 7411428, IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015, Institute of Electrical and Electronics Engineers Inc., pp. 373-375, IEEE MTT-S International Microwave and RF Conference, IMaRC 2015, Hyderabad, India, 12/10/15. https://doi.org/10.1109/IMaRC.2015.7411428

Domain patterned permalloy incorporated above and below on-chip RF spiral inductors. / Pulijala, Vasu; Azeemuddin, Syed.
IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015. Institute of Electrical and Electronics Engineers Inc., 2016. p. 373-375 7411428 (IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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PY - 2016/2/17

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N2 - This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.

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M3 - Conference contribution

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Pulijala V, Azeemuddin S. Domain patterned permalloy incorporated above and below on-chip RF spiral inductors. In IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015. Institute of Electrical and Electronics Engineers Inc. 2016. p. 373-375. 7411428. (IEEE MTT-S International Microwave and RF Conference 2015, IMaRC 2015). doi: 10.1109/IMaRC.2015.7411428

Domain patterned permalloy incorporated above and below on-chip RF spiral inductors

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