Dry‐developed organosilicon resists for 193‐nm excimer laser lithography

R. R. Kunz, M. W. Horn

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Fingerprint

Dive into the research topics of 'Dry‐developed organosilicon resists for 193‐nm excimer laser lithography'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds