Keyphrases
Reactor Design
100%
MgB2 Thin Film
100%
Hybrid Physical-chemical Vapor Deposition (HPCVD)
100%
Reactor
50%
Growth Rate
50%
Substrate Temperature
50%
Film Deposition
50%
Reactor Configuration
25%
Boron
25%
Film Growth
25%
Temperature Effect
25%
Gas Stream
25%
Published Results
25%
Model Simulation
25%
Chemistry Model
25%
Computational Fluid Dynamics
25%
Sapphire
25%
Thick Film
25%
MgB2
25%
Mass Transfer
25%
Gas-phase Chemistry
25%
Surface Chemistry
25%
Concentration Profile
25%
Thin Film Deposition
25%
Modeling Results
25%
Computational Fluid Dynamics Simulation
25%
MgB2 Film
25%
Superconducting Transition Temperature
25%
Simulation Experiment
25%
Dynamic Base
25%
Low Substrate Temperature
25%
Gas-phase Concentration
25%
Temperature Phase
25%
Boron Film
25%
Boron Deposition
25%
New Reactors
25%
Reactor Modeling
25%
Film Properties
25%
Flow Phases
25%
Engineering
Thin Films
100%
Reactor Design
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Substrate Temperature
75%
Computational Fluid Dynamics
50%
Gas-Phase
50%
Experimental Result
25%
Temperature Phase
25%
Gas Streams
25%
Temperature Dependency
25%
Concentration Profile
25%
Simulation Model
25%
Phase Concentration
25%
Gas Flow
25%
Area Substrate
25%
Film Property
25%
Material Science
Boron
100%
Thin Films
100%
Chemical Vapor Deposition
100%
Film
50%
Computational Fluid Dynamics
50%
Film Deposition
50%
Film Growth
25%
Electrical Resistivity
25%
Sapphire
25%
Thick Films
25%
Thin Film Deposition
25%
Gas Flow
25%
Reactor Modeling
25%
Chemical Engineering
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Reactor Configuration
10%
New Reactors
10%