Effect of lift-off conditions on micropatterning of nanocrystalline quantum dot films

Ala H. Sabeeh, Jared S. Price, Jerzy Ruzyllo

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


A micropatterning of nanocrystalline quantum dots (NQD) films using lift-off process has been proposed and experimentally demonstrated earlier. In this paper, the conditions of patterning process are investigated in order to define process parameters window for the lift-off procedure. The patterning of NQD CdSe/ZnS films using lift-off is studied in terms of photoresist thickness, solvent composition, and substrate material. The outcome of the process is monitored by means of fluorescence microscopy, atomic force microscope, and optical microscopy. The results show that patterns less than 1 μm can be resolved in NQD films with minimal alteration of the film characteristics, provided the photoresist layer is thicker than about 100 nm and acetone used as a solvent is spiked with toluene up to 10% of the solvent volume. The performance of the process in terms of resolution and film quality was found to be independent of the substrate used.

Original languageEnglish (US)
Article number061802
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Issue number6
StatePublished - Nov 1 2017

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry


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