Rates of vaporization of liquid iron and copper drops were determined both in the presence and the absence of a low-pressure argon plasma. The vaporization rates of pure metal drops and metal drops that were doped with small amounts of oxygen or sulfur were found to decrease when plasma was present. The results are consistent with the presence of a charge distribution field in close proximity of the interface.
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering