Effect of Plasma Etching Edge-Type Exposures on Si Substrates: A Correlation Between Carrier Lifetime and Etch-Induced Defect States

Tieer Gu, O. O. Awadelkarim, S. J. Fonash, J. F. Rembetski, Y. D. Chan

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

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Material Science

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Engineering