Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Nitrogen-polar (N-polar)
100%
Surface Roughness
66%
Growth Conditions
33%
Structural Properties
33%
Qualitative Modeling
33%
Sapphire Substrate
33%
Contrast Enhancement
33%
Nucleate
33%
Surface Polarity
33%
Growth Form
33%
Surface Facet
33%
Surface Termination
33%
Stable Surface
33%
Electron Diffraction Pattern
33%
Lateral Growth
33%
Structural Growth
33%
AlN Buffer Layer
33%
N-polar GaN
33%
Chemical Vapor Deposition Growth
33%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Growth Condition
33%
Structural Property
33%
Sapphire Substrate
33%
Lateral Growth
33%
Growth Mode
33%
Surface Termination
33%
Earth and Planetary Sciences
Metalorganic Chemical Vapor Deposition
100%
Flat Surface
33%
Diffraction Pattern
33%
Material Science
Convergent Beam Electron Diffraction
33%