Abstract
Mist deposition is a novel method of depositing thin films of liquid precursors. The surface condition of silicon and SiO 2 substrates determines the wetting properties of liquid precursors used in mist deposition. This property has been utilized in this study to selectively deposit various liquid precursors on SiO 2 substrates. The effect of geometry of structures was also investigated. It is demonstrated that under the proper surface conditions films of selected dielectrics can be selectively deposited.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 105-110 |
| Number of pages | 6 |
| Journal | ECS Transactions |
| Volume | 1 |
| Issue number | 3 |
| State | Published - Dec 1 2005 |
| Event | 9th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing - 2005 Fall Meeting of the Electrochemical Society - Los Angeles, CA, United States Duration: Oct 16 2005 → Oct 21 2005 |
All Science Journal Classification (ASJC) codes
- General Engineering