Keyphrases
Crystallization
100%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
A-Si
100%
Deposition Parameters
100%
Amorphous Silicon Thin Film
100%
Polycrystalline Silicon Film
75%
Grain Size
25%
Transmission Electron Microscopy
25%
Spectroscopic Ellipsometry
25%
Angstrom
25%
Precursor Material
25%
Silane
25%
Polysilicon
25%
Solid Phase
25%
Glass Substrate
25%
Deposition Temperature
25%
Large Grain Size
25%
Film Deposition
25%
Film Grain
25%
Low Deposition Temperature
25%
Material Science
Film
100%
Amorphous Silicon
100%
Silicon
57%
Grain Size
28%
Density
28%
Thin Films
14%
Transmission Electron Microscopy
14%
Annealing
14%
Plasma-Enhanced Chemical Vapor Deposition
14%
Silane
14%
Film Deposition
14%