Engineering & Materials Science
Plasma enhanced chemical vapor deposition
100%
Amorphous silicon
96%
Crystallization
76%
Polysilicon
46%
Spectroscopic ellipsometry
18%
Silanes
12%
Temperature
12%
Transmission electron microscopy
10%
Annealing
9%
Deposits
9%
Thin films
9%
Plasmas
9%
Furnaces
8%
Glass
8%
Substrates
7%
Physics & Astronomy
silicon films
75%
amorphous silicon
64%
crystallization
54%
voids
30%
grain size
26%
silanes
19%
ellipsometry
17%
solid phases
16%
furnaces
15%
deposits
15%
temperature
15%
vapor deposition
13%
annealing
10%
glass
10%
silicon
9%
thin films
9%
Chemical Compounds
Amorphous Silicon
95%
Polycrystalline Solid
35%
Liquid Film
34%
Grain Size
18%
Plasma Enhanced Chemical Vapour Deposition
12%
Ellipsometry
11%
Glass Substrate
9%
Annealing
7%
Transmission Electron Microscopy
6%
Plasma
6%