Effects of deuterium plasma treatments on the electrical properties of boron-doped silicon

Keyphrases

• Electrical Properties 100%
• Plasma Treatment 100%
• Boron-doped Silicon 100%
• Depth Profile 50%
• Deep Level Transient Spectroscopy 50%
• Schottky Diode 50%
• Vacancy Defects 50%
• Spectroscopic Measurement 50%
• Deuterium 50%
• Annealing Behavior 50%
• Plasma Etching 50%
• Reactive Ion Etching 50%
• Capacitance Measurement 50%
• Defect Complexes 50%
• Pair-ion Plasma 50%
• Surface Traps 50%
• Junction Capacitance 50%

Chemistry

• Silicon 100%
• Deuterium(.) 100%
• Electrical Property 100%
• Deep Level Transient Spectroscopy 50%
• Capacitance Measurement 50%