Electrical modeling of through silicon and package vias

Tapobrata Bandyopadhyay, Ritwik Chatterjee, Daehyun Chung, Madhavan Swaminathan, Rao Tummala

Research output: Chapter in Book/Report/Conference proceedingConference contribution

108 Scopus citations

Abstract

This paper presents analytical modeling and 3D full-wave electromagnetic (EM) simulation of the bias voltage dependent semiconductor (MOS) capacitance of a Through Silicon Via (TSV). An accurate electrical model of the TSV is proposed by considering the semiconductor effects. The highfrequency electrical performance of TSVs and Through-Package Vias (TPVs) are compared by means of 3D EM simulations. A parametric study is performed on TSV capacitance and design guidelines are presented for signal and power TSVs.

Original languageEnglish (US)
Title of host publication2009 IEEE International Conference on 3D System Integration, 3DIC 2009
DOIs
StatePublished - 2009
Event2009 IEEE International Conference on 3D System Integration, 3DIC 2009 - San Francisco, CA, United States
Duration: Sep 28 2009Sep 30 2009

Publication series

Name2009 IEEE International Conference on 3D System Integration, 3DIC 2009

Other

Other2009 IEEE International Conference on 3D System Integration, 3DIC 2009
Country/TerritoryUnited States
CitySan Francisco, CA
Period9/28/099/30/09

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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