Skip to main navigation Skip to search Skip to main content

Electrically active defects in surface pre-amorphized Si under rapid thermal anneal and their removal by concurrent titanium silicidation

  • D. Z. Chi
  • , S. Ashok
  • , D. Theodore

Research output: Contribution to journal › Article › peer-review

Fingerprint

Dive into the research topics of 'Electrically active defects in surface pre-amorphized Si under rapid thermal anneal and their removal by concurrent titanium silicidation'. Together they form a unique fingerprint.
Sort by

Keyphrases

Material Science

Engineering