Electrically active defects in surface preamorphized and subsequently RTP-annealed Si and the effect of titanium silicidation

D. Z. Chi, S. Ashok

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Electrically active defects in surface preamorphized and subsequently RTP-annealed Si and the effect of titanium silicidation'. Together they form a unique fingerprint.

Keyphrases

Material Science

Physics

Engineering