TY - GEN
T1 - Electrically tunable second harmonic generation enhancement on a parametrically excited metasurface
AU - Guo, Xuexue
AU - Ding, Yimin
AU - Ni, Xingjie
N1 - Publisher Copyright:
CLEO 2020 © OSA 2020.
PY - 2020
Y1 - 2020
N2 - Leveraging the resonantly enhanced parametric excitation of amorphous silicon metasurface, we achieved second harmonic generation (SHG) with ultra-high ON/OFF ratio of 15000. It provides a compact and electrically tunable approach to boosting and dynamically controlling SHG.
AB - Leveraging the resonantly enhanced parametric excitation of amorphous silicon metasurface, we achieved second harmonic generation (SHG) with ultra-high ON/OFF ratio of 15000. It provides a compact and electrically tunable approach to boosting and dynamically controlling SHG.
UR - http://www.scopus.com/inward/record.url?scp=85095417244&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85095417244&partnerID=8YFLogxK
U2 - 10.1364/CLEO_QELS.2020.FTh1C.3
DO - 10.1364/CLEO_QELS.2020.FTh1C.3
M3 - Conference contribution
AN - SCOPUS:85095417244
SN - 9781943580767
T3 - Optics InfoBase Conference Papers
BT - CLEO
PB - Optica Publishing Group (formerly OSA)
T2 - CLEO: QELS_Fundamental Science, CLEO_QELS 2020
Y2 - 10 May 2020 through 15 May 2020
ER -