Electrodeposition of metallic nanowire thin films using mesoporous silica templates

Donghai Wang; Weilie L. Zhou; Byron F. McCaughy; J. Eric Hampsey; Xianglin Ji; Ying Bing Jiang; Huifang Xu; Jinke Tang; Russell H. Schmehl; Charles O'Connor; C. Jeffrey Brinker; Yunfeng Lu

doi:10.1002/adma.200390025

Electrodeposition of metallic nanowire thin films using mesoporous silica templates

Donghai Wang
, Weilie L. Zhou
, Byron F. McCaughy
, J. Eric Hampsey
, Xianglin Ji
, Ying Bing Jiang
, Huifang Xu
, Jinke Tang
, Russell H. Schmehl
, Charles O'Connor
, C. Jeffrey Brinker
, Yunfeng Lu

Research output: Contribution to journal › Article › peer-review

135 Scopus citations

Abstract

The fabrication of metal thin films composed of ordered arrays of metal nanowires that were grown electrochemically within silica mesoporous channels was discussed. Nanowires were continually grown from the bottom until the mesoporous channels were filled. Electrodeposited metal nanowires were characterized by transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS) and scanning electron microscopy (SEM).

Original language	English (US)
Pages (from-to)	130-133
Number of pages	4
Journal	Advanced Materials
Volume	15
Issue number	2
DOIs	https://doi.org/10.1002/adma.200390025
State	Published - Jan 16 2003

All Science Journal Classification (ASJC) codes

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.200390025

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title = "Electrodeposition of metallic nanowire thin films using mesoporous silica templates",

abstract = "The fabrication of metal thin films composed of ordered arrays of metal nanowires that were grown electrochemically within silica mesoporous channels was discussed. Nanowires were continually grown from the bottom until the mesoporous channels were filled. Electrodeposited metal nanowires were characterized by transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS) and scanning electron microscopy (SEM).",

author = "Donghai Wang and Zhou, \{Weilie L.\} and McCaughy, \{Byron F.\} and Hampsey, \{J. Eric\} and Xianglin Ji and Jiang, \{Ying Bing\} and Huifang Xu and Jinke Tang and Schmehl, \{Russell H.\} and Charles O'Connor and Brinker, \{C. Jeffrey\} and Yunfeng Lu",

year = "2003",

month = jan,

day = "16",

doi = "10.1002/adma.200390025",

language = "English (US)",

volume = "15",

pages = "130--133",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "2",

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TY - JOUR

T1 - Electrodeposition of metallic nanowire thin films using mesoporous silica templates

AU - Wang, Donghai

AU - Zhou, Weilie L.

AU - McCaughy, Byron F.

AU - Hampsey, J. Eric

AU - Ji, Xianglin

AU - Jiang, Ying Bing

AU - Xu, Huifang

AU - Tang, Jinke

AU - Schmehl, Russell H.

AU - O'Connor, Charles

AU - Brinker, C. Jeffrey

AU - Lu, Yunfeng

PY - 2003/1/16

Y1 - 2003/1/16

N2 - The fabrication of metal thin films composed of ordered arrays of metal nanowires that were grown electrochemically within silica mesoporous channels was discussed. Nanowires were continually grown from the bottom until the mesoporous channels were filled. Electrodeposited metal nanowires were characterized by transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS) and scanning electron microscopy (SEM).

AB - The fabrication of metal thin films composed of ordered arrays of metal nanowires that were grown electrochemically within silica mesoporous channels was discussed. Nanowires were continually grown from the bottom until the mesoporous channels were filled. Electrodeposited metal nanowires were characterized by transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS) and scanning electron microscopy (SEM).

UR - https://www.scopus.com/pages/publications/0037448716

UR - https://www.scopus.com/pages/publications/0037448716#tab=citedBy

U2 - 10.1002/adma.200390025

DO - 10.1002/adma.200390025

M3 - Article

AN - SCOPUS:0037448716

SN - 0935-9648

VL - 15

SP - 130

EP - 133

JO - Advanced Materials

JF - Advanced Materials

IS - 2

ER -

Electrodeposition of metallic nanowire thin films using mesoporous silica templates

Abstract

All Science Journal Classification (ASJC) codes

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