Abstract
Electron field emission tests have been performed on films grown by a modified microwave plasma assisted chemical vapor deposition diamond process. This modification includes the addition of N2 and O2 during the growth stage. Characterization of these films shows the presence of a disordered tetrahedral carbon structure. Raman spectroscopy indicates a disturbance in the cubic symmetry of the lattice and X-ray diffraction indicates a disordered tetrahedral structure. Field emission testing indicate that current densities of 0.5 mA/cm2 can be obtained for applied fields of 5-8 V/μm. The results are explained in terms of a change in the band structure and the formation of electronic states in the band gap.
Original language | English (US) |
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Pages | 103-106 |
Number of pages | 4 |
State | Published - Dec 1 1997 |
Event | Proceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97 - Kyongju, Korea Duration: Aug 17 1997 → Aug 21 1997 |
Other
Other | Proceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97 |
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City | Kyongju, Korea |
Period | 8/17/97 → 8/21/97 |
All Science Journal Classification (ASJC) codes
- Surfaces and Interfaces