Energy resolved spin dependent tunneling in 1.2 nm dielectrics

We demonstrate an electron paramagnetic resonance technique which simply links point defect structure and energy levels in a very direct way. The technique's simplicity and the robust character of the response make it, at least potentially, of widespread utility in the understanding of defects important in solid state electronics. Since the specific defect observed is generated in silicon oxynitride by high electric field stressing, an important device instability problem in present day integrated circuitry, the observations are of considerable importance for microelectronics technology.