Engineering Surfaces through Sequential Stop-Flow Photopatterning

Christian W. Pester; Benjaporn Narupai; Kaila M. Mattson; David P. Bothman; Daniel Klinger; Kenneth W. Lee; Emre H. Discekici; Craig J. Hawker

doi:10.1002/adma.201602900

Engineering Surfaces through Sequential Stop-Flow Photopatterning

Christian W. Pester, Benjaporn Narupai, Kaila M. Mattson, David P. Bothman, Daniel Klinger, Kenneth W. Lee, Emre H. Discekici, Craig J. Hawker

Chemical Engineering

Research output: Contribution to journal › Article › peer-review

74 Scopus citations

Abstract

The combination of stopped-flow techniques and reduction photolithography is described to engineer a modular platform for sequential photochemical reactions in a continuous manner. This facilitates chemical surface patterning through successive exchange of reactants within a stop-flow cell, while providing significant flexibility to exchange light sources, and spatially decoupled photomasks. Spatially controlled photopolymerization, followed by exchange of the solution within the stop-flow cell, and secondary functionalization of polymer brushes by light-mediated removal of the active terminal bromine chain end are observed during the investigations.

Original language	English (US)
Pages (from-to)	9292-9300
Number of pages	9
Journal	Advanced Materials
Volume	28
Issue number	42
DOIs	https://doi.org/10.1002/adma.201602900
State	Published - Nov 2016

All Science Journal Classification (ASJC) codes

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201602900

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title = "Engineering Surfaces through Sequential Stop-Flow Photopatterning",

abstract = "The combination of stopped-flow techniques and reduction photolithography is described to engineer a modular platform for sequential photochemical reactions in a continuous manner. This facilitates chemical surface patterning through successive exchange of reactants within a stop-flow cell, while providing significant flexibility to exchange light sources, and spatially decoupled photomasks. Spatially controlled photopolymerization, followed by exchange of the solution within the stop-flow cell, and secondary functionalization of polymer brushes by light-mediated removal of the active terminal bromine chain end are observed during the investigations.",

author = "Pester, {Christian W.} and Benjaporn Narupai and Mattson, {Kaila M.} and Bothman, {David P.} and Daniel Klinger and Lee, {Kenneth W.} and Discekici, {Emre H.} and Hawker, {Craig J.}",

year = "2016",

month = nov,

doi = "10.1002/adma.201602900",

language = "English (US)",

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journal = "Advanced Materials",

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AU - Pester, Christian W.

AU - Narupai, Benjaporn

AU - Mattson, Kaila M.

AU - Bothman, David P.

AU - Klinger, Daniel

AU - Lee, Kenneth W.

AU - Discekici, Emre H.

AU - Hawker, Craig J.

PY - 2016/11

Y1 - 2016/11

N2 - The combination of stopped-flow techniques and reduction photolithography is described to engineer a modular platform for sequential photochemical reactions in a continuous manner. This facilitates chemical surface patterning through successive exchange of reactants within a stop-flow cell, while providing significant flexibility to exchange light sources, and spatially decoupled photomasks. Spatially controlled photopolymerization, followed by exchange of the solution within the stop-flow cell, and secondary functionalization of polymer brushes by light-mediated removal of the active terminal bromine chain end are observed during the investigations.

AB - The combination of stopped-flow techniques and reduction photolithography is described to engineer a modular platform for sequential photochemical reactions in a continuous manner. This facilitates chemical surface patterning through successive exchange of reactants within a stop-flow cell, while providing significant flexibility to exchange light sources, and spatially decoupled photomasks. Spatially controlled photopolymerization, followed by exchange of the solution within the stop-flow cell, and secondary functionalization of polymer brushes by light-mediated removal of the active terminal bromine chain end are observed during the investigations.

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SP - 9292

EP - 9300

JO - Advanced Materials

JF - Advanced Materials

IS - 42

ER -

Engineering Surfaces through Sequential Stop-Flow Photopatterning

Abstract

All Science Journal Classification (ASJC) codes

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