TY - JOUR
T1 - Enhanced Cooling of Multifinger GaN HEMTs via Topside Diamond Integration
AU - Shoemaker, Daniel C.
AU - Woo, Kelly
AU - Song, Yiwen
AU - Malakoutian, Mohamadali
AU - Zivasatienraj, Bill
AU - Srivastava, Puneet
AU - Wildeson, Isaac
AU - Chowdhury, Srabanti
AU - Choi, Sukwon
N1 - Publisher Copyright:
© 1980-2012 IEEE.
PY - 2025
Y1 - 2025
N2 - Gallium nitride high electron mobility transistors (HEMTs) are key components for today's 5G power amplifiers. However, device overheating requires commercial devices to operate under derated power levels. This work reports the cooling effectiveness of a top-side diamond heat spreader for a 16-finger GaN/SiC HEMT using gate resistance thermometry. A 2μ m thick diamond heat spreader was found to reduce the gate temperature rise by ∼20% at 12 W/mm. Simulation results indicate that a diamond thickness greater than 1.5μm is required to achieve a 10% reduction in the device thermal resistance (RTh). To achieve a 10% reduction in the RTh, the thermal conductivity of a 2μm thick diamond layer needs to be greater than 450 W/m·K and the SiN protection layer should be thinner than 75 nm. The incorporation of topside diamond combined with replacing the SiC substrate with diamond was shown to reduce the RTh by 42.2% compared to a standard GaN/SiC HEMT in simulation.
AB - Gallium nitride high electron mobility transistors (HEMTs) are key components for today's 5G power amplifiers. However, device overheating requires commercial devices to operate under derated power levels. This work reports the cooling effectiveness of a top-side diamond heat spreader for a 16-finger GaN/SiC HEMT using gate resistance thermometry. A 2μ m thick diamond heat spreader was found to reduce the gate temperature rise by ∼20% at 12 W/mm. Simulation results indicate that a diamond thickness greater than 1.5μm is required to achieve a 10% reduction in the device thermal resistance (RTh). To achieve a 10% reduction in the RTh, the thermal conductivity of a 2μm thick diamond layer needs to be greater than 450 W/m·K and the SiN protection layer should be thinner than 75 nm. The incorporation of topside diamond combined with replacing the SiC substrate with diamond was shown to reduce the RTh by 42.2% compared to a standard GaN/SiC HEMT in simulation.
UR - https://www.scopus.com/pages/publications/105010680004
UR - https://www.scopus.com/pages/publications/105010680004#tab=citedBy
U2 - 10.1109/LED.2025.3588202
DO - 10.1109/LED.2025.3588202
M3 - Article
AN - SCOPUS:105010680004
SN - 0741-3106
VL - 46
SP - 1597
EP - 1600
JO - IEEE Electron Device Letters
JF - IEEE Electron Device Letters
IS - 9
ER -