Enhanced field emission from the contact between metal and dielectric

M. S. Chung, B. G. Yoon, A. Mayer, B. L. Weiss, N. M. Miskovsky, P. H. Cutler

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have investigated the enhanced field emission at the contact between metal and dielectric. Such a strong enhancement of field emission has been often observed as a breakdown and is considered to be due to dielectric [1]. It seems that the enhancement of emission has two reasons [2]. One is the polarization of dielectric due to the charge on the metal. The polarization charges, in return, attract free charges on the metal toward the junction, which leads to the high surface chare density near the junction. The other is the space charges produced by the very enhanced field, in dielectric. Due to a lot of space charges, the contact barrier between metal and dielectric is thinned and lowered, which leads to the production of a detour path from metal through dielectric to vacuum. The detour path can be more preferable by the view of potential energy than the direct path from metal-vacuum. We evaluate the two effects to explain the enhancement of field emission in problem.

Original languageEnglish (US)
Title of host publicationProceedings - 2010 8th International Vacuum Electron Sources Conference and Nanocarbon, IVESC 2010 and NANOcarbon 2010
Pages21-22
Number of pages2
DOIs
StatePublished - 2010
Event8th International Vacuum Electron Sources Conference, IVESC 2010 and NANOcarbon 2010 - Nanjing, China
Duration: Oct 14 2010Oct 16 2010

Publication series

NameProceedings - 2010 8th International Vacuum Electron Sources Conference and Nanocarbon, IVESC 2010 and NANOcarbon 2010

Other

Other8th International Vacuum Electron Sources Conference, IVESC 2010 and NANOcarbon 2010
Country/TerritoryChina
CityNanjing
Period10/14/1010/16/10

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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