@article{e96f6436180c4355ba6ba48597f05323,
title = "Enhanced nucleation, smoothness and conformality of ultrananocrystalline diamond (UNCD) ultrathin films via tungsten interlayers",
abstract = "Extremely smooth (6 nm RMS roughness over 4 μm2), thin (100 nm), and continuous ultrananocrystalline diamond (UNCD) films were synthesized by microwave plasma chemical vapor deposition using a 10 nm tungsten (W) interlayer between the silicon substrate and the diamond film. These UNCD films possess a high content of sp3-bonded carbon. The W interlayer significantly increased the initial diamond nucleation density, thereby lowering the surface roughness, eliminating interfacial voids, and allowing thinner UNCD films to be grown. This structural optimization enhances the films' properties and enables its integration with a wide variety of substrate materials.",
author = "Naguib, {Nevin N.} and Elam, {Jeffrey W.} and James Birrell and Jian Wang and Grierson, {David S.} and Bernd Kabius and Hiller, {Jon M.} and Sumant, {Anirudha V.} and Carpick, {Robert W.} and Orlando Auciello and Carlisle, {John A.}",
note = "Funding Information: We gratefully acknowledge A.R. Konicek and S.D. O{\textquoteright}Connor for assistance with the NEXAFS measurements. Electron microscopy was done at the Electron Microscopy Center at Argonne National Laboratory. The micro-tip arrays were obtained from North Carolina State University (NCSU). NEXAFS measurements were conducted at the Synchrotron Radiation Center (NSF Grant DMR 0084402). UW-Madison authors acknowledge support from Air Force Office of Scientific Research, grant FA9550-05-1-0204. ANL authors acknowledge the continuous support of the US DOE Office of Science – BES Materials Science under Contract Number W-31-109-ENG-38.",
year = "2006",
month = oct,
day = "30",
doi = "10.1016/j.cplett.2006.08.137",
language = "English (US)",
volume = "430",
pages = "345--350",
journal = "Chemical Physics Letters",
issn = "0009-2614",
publisher = "Elsevier B.V.",
number = "4-6",
}