Abstract
Enhancement of Schottky barrier height of Ti-Pt-Au on n-type GaAs was obtained by heavily (2×1018 cm-3) counter doping the near-surface region of the substrate. The p-type region was produced by recoil implantation of Mg from a Mg thin film (300 Å) irradiated by a 60 keV As+ beam. The film was subsequently chemically etched. The recoil-implanted samples showed an enhancement of 140 meV in the Schottky barrier height following rapid thermal annealing in an AsH3 furnace at 850°C for nominal zero second.
Original language | English (US) |
---|---|
Pages (from-to) | 1696-1698 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 54 |
Issue number | 17 |
DOIs | |
State | Published - 1989 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)