Enhancement of near-field phase-shifting contact lithography by immersion technique

Katherine E. Weaver, Fei Wang, Akhlesh Lakhtakia

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


Near-field phase-shifting contact lithography is theoretically modeled incorporating the immersion technique for improvement of photoresist features. The absorption patterns in the photoresist layer, which correspond to the resolution of features after development, are found to be localized in a more compact and uniform fashion with the immersed lithographic system than with the dry system. Therefore, the resolution and profiles of the high-aspect-ratio features can be notably enhanced by immersion lithography.

Original languageEnglish (US)
Pages (from-to)183-187
Number of pages5
Issue number4
StatePublished - Apr 3 2006

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering


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