@article{35625fda841843a49a1086cc8ded2ba4,
title = "Epitaxial Ferroelectric Hf0.5Zr0.5O2 with Metallic Pyrochlore Oxide Electrodes",
abstract = "The synthesis of fully epitaxial ferroelectric Hf0.5Zr0.5O2 (HZO) thin films through the use of a conducting pyrochlore oxide electrode that acts as a structural and chemical template is reported. Such pyrochlores, exemplified by Pb2Ir2O7(PIO) and Bi2Ru2O7(BRO), exhibit metallic conductivity with room-temperature resistivity of <1 mΩ cm and are closely lattice matched to yttria-stabilized zirconia substrates as well as the HZO layers grown on top of them. Evidence for epitaxy and domain formation is established with X-ray diffraction and scanning transmission electron microscopy, which show that the c-axis of the HZO film is normal to the substrate surface. The emergence of the non-polar-monoclinic phase from the polar-orthorhombic phase is observed when the HZO film thickness is ≥≈30 nm. Thermodynamic analyses reveal the role of epitaxial strain and surface energy in stabilizing the polar phase as well as its coexistence with the non-polar-monoclinic phase as a function of film thickness.",
author = "Zimeng Zhang and Hsu, {Shang Lin} and Stoica, {Vladimir A.} and Hanjong Paik and Eric Parsonnet and Alexander Qualls and Jianjun Wang and Liang Xie and Mukesh Kumari and Sujit Das and Zhinan Leng and Martin McBriarty and Roger Proksch and Alexei Gruverman and Schlom, {Darrell G.} and Chen, {Long Qing} and Sayeef Salahuddin and Martin, {Lane W.} and Ramamoorthy Ramesh",
note = "Funding Information: Z.Z., S.‐L.H., and V.S. contributed equally to this work. Z.Z., R.R., and D.G.S. acknowledge the support from ASCENT, one of six centers in JUMP, a Semiconductor Research Corporation (SRC) program sponsored by DARPA. H.P. acknowledges support from the National Science Foundation (Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials [PARADIM]) under Cooperative Agreement No. DMR‐1539918. S.‐L.H. acknowledges support from the Quantum Materials program, funded by the US Department of Energy, Office of Basic Energy Sciences, and Materials Sciences Division. The electron microscopy work was carried out at the National Center for Electron Microscopy (Molecular Foundry@LBNL). L.W.M. acknowledges the support of the National Science Foundation under grant DMR‐1708615. V.A.S. acknowledges support from the US Department of Energy Office of Science‐Basic Energy Sciences, under Award Number DE‐SC‐0012375 for the development of the materials and synchrotron‐based study of ferroic thin films. V.A.S. is grateful and would like to thank to Evguenia Karapetrova and Zhan Zhan for their support in performing the experiments at the Advanced Photon Source, Argonne National Laboratory. This research used resources of the Advanced Photon Source, a US Department of Energy (DOE) Office of Science User Facility, operated for the DOE Office of Science by Argonne National Laboratory under Contract No. DE‐AC02‐06CH11357. Extraordinary facility operations were supported in part by the DOE Office of Science through the National Virtual Biotechnology Laboratory, a consortium of DOE national laboratories focused on the response to COVID‐19, with funding provided by the Coronavirus CARES Act. Funding Information: Z.Z., S.-L.H., and V.S. contributed equally to this work. Z.Z.,?R.R.,?and D.G.S. acknowledge the support from ASCENT, one of six centers in JUMP, a Semiconductor Research Corporation (SRC) program sponsored by DARPA. H.P. acknowledges support from the National Science Foundation (Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials [PARADIM]) under Cooperative Agreement No. DMR-1539918. S.-L.H. acknowledges support from the Quantum Materials program, funded by the US Department of Energy, Office of Basic Energy Sciences, and Materials Sciences Division. The electron microscopy work was carried out at the National Center for Electron Microscopy (Molecular Foundry@LBNL). L.W.M. acknowledges the support of the National Science Foundation under grant DMR-1708615. V.A.S. acknowledges support from the US Department of Energy Office of Science-Basic Energy Sciences, under Award Number DE-SC-0012375 for the development of the materials and synchrotron-based study of ferroic thin films. V.A.S. is grateful and would like to thank to Evguenia Karapetrova and Zhan Zhan for their support in performing the experiments at the Advanced Photon Source, Argonne National Laboratory. This research used resources of the Advanced Photon Source, a US Department of Energy (DOE) Office of Science User Facility, operated for the DOE Office of Science by Argonne National Laboratory under Contract No. DE-AC02-06CH11357. Extraordinary facility operations were supported in part by the DOE Office of Science through the National Virtual Biotechnology Laboratory, a consortium of DOE national laboratories focused on the response to COVID-19, with funding provided by the Coronavirus CARES Act. Publisher Copyright: {\textcopyright} 2021 Wiley-VCH GmbH",
year = "2021",
month = mar,
day = "11",
doi = "10.1002/adma.202006089",
language = "English (US)",
volume = "33",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "10",
}