TY - JOUR
T1 - Erosion of Ag surface by continuous irradiation with slow, large Ar clusters
AU - Rzeznik, Lukasz
AU - Paruch, Robert
AU - Garrison, Barbara J.
AU - Postawa, Zbigniew
N1 - Funding Information:
The authors thank the Polish Ministry of Science and Higher Education programs No. PB 4097/H03/2007/33 and PB 1247/B/H03/2010/39 and the Chemistry Division of the National Science Foundation Grant No. CHE-0910564 for their financial support of this research. The authors also thank The Pennsylvania State University High Performance Computing Group for use of their computing resources and technical support.
PY - 2011/7/15
Y1 - 2011/7/15
N2 - Molecular dynamics computer simulations are employed to probe processes taking place during continuous irradiation of Ag(1 1 1) surface by keV Ar 872 projectiles. Surface modification, the total sputtering yield, and the angular distributions of ejected species are calculated at fluences ranging from 0 up to ∼6 × 1013 impacts/cm2. It has been shown that two trends can be identified in the development of surface roughness. At the beginning surface roughness increases fast. This fast increase terminates around 1 × 1013 impacts/cm2 and is followed by a slow increase that finally saturates. The effect of the surface roughness on the sputtering yield depends on the impact angle. At normal incidence the sputtering yield is rather insensitive to the development of the surface topography. Modification of the surface morphology has, however, a significant influence on the total sputtering yield at large impact angles. Both the shape of the sputtering yield dependence on the impact angle and the angular spectra of ejected particles are sensitive to the surface roughness.
AB - Molecular dynamics computer simulations are employed to probe processes taking place during continuous irradiation of Ag(1 1 1) surface by keV Ar 872 projectiles. Surface modification, the total sputtering yield, and the angular distributions of ejected species are calculated at fluences ranging from 0 up to ∼6 × 1013 impacts/cm2. It has been shown that two trends can be identified in the development of surface roughness. At the beginning surface roughness increases fast. This fast increase terminates around 1 × 1013 impacts/cm2 and is followed by a slow increase that finally saturates. The effect of the surface roughness on the sputtering yield depends on the impact angle. At normal incidence the sputtering yield is rather insensitive to the development of the surface topography. Modification of the surface morphology has, however, a significant influence on the total sputtering yield at large impact angles. Both the shape of the sputtering yield dependence on the impact angle and the angular spectra of ejected particles are sensitive to the surface roughness.
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U2 - 10.1016/j.nimb.2010.11.098
DO - 10.1016/j.nimb.2010.11.098
M3 - Article
AN - SCOPUS:79959284116
SN - 0168-583X
VL - 269
SP - 1586
EP - 1590
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 14
ER -