Erratum: Maskless fabrication of nanowells using chemically reactive colloids (Nano Letters (2011) 11 (672) DOI: 10.1021/nl1037984)

Neetu Chaturvedi; Erik Hsiao; Darrell Velegol; Seong H. Kim

doi:10.1021/nl202236p

Erratum: Maskless fabrication of nanowells using chemically reactive colloids (Nano Letters (2011) 11 (672) DOI: 10.1021/nl1037984)

Neetu Chaturvedi, Erik Hsiao, Darrell Velegol, Seong H. Kim

Chemical Engineering

Research output: Contribution to journal › Comment/debate › peer-review

1 Scopus citations

Original language	English (US)
Pages (from-to)	3511
Number of pages	1
Journal	Nano letters
Volume	11
Issue number	8
DOIs	https://doi.org/10.1021/nl202236p
State	Published - Aug 10 2011

All Science Journal Classification (ASJC) codes

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl202236p

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author = "Neetu Chaturvedi and Erik Hsiao and Darrell Velegol and Kim, \{Seong H.\}",

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AU - Velegol, Darrell

AU - Kim, Seong H.

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Erratum: Maskless fabrication of nanowells using chemically reactive colloids (Nano Letters (2011) 11 (672) DOI: 10.1021/nl1037984)

All Science Journal Classification (ASJC) codes

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