Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

Susanne Stemmer; Zhiqiang Chen; Ralf Keding; Jon Paul Maria; Dwi Wicaksana; Angus I. Kingon

doi:10.1063/1.1519098

Erratum: Stability of ZrO₂ layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

Susanne Stemmer
, Zhiqiang Chen
, Ralf Keding
, Jon Paul Maria
, Dwi Wicaksana
, Angus I. Kingon

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Pages (from-to)	6942
Number of pages	1
Journal	Journal of Applied Physics
Volume	92
Issue number	11
DOIs	https://doi.org/10.1063/1.1519098
State	Published - Dec 1 2002

All Science Journal Classification (ASJC) codes

General Physics and Astronomy

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10.1063/1.1519098

Cite this

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title = "Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))",

author = "Susanne Stemmer and Zhiqiang Chen and Ralf Keding and Maria, \{Jon Paul\} and Dwi Wicaksana and Kingon, \{Angus I.\}",

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T2 - Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

AU - Stemmer, Susanne

AU - Chen, Zhiqiang

AU - Keding, Ralf

AU - Maria, Jon Paul

AU - Wicaksana, Dwi

AU - Kingon, Angus I.

PY - 2002/12/1

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M3 - Comment/debate

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -

Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

All Science Journal Classification (ASJC) codes

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Cite this

Erratum: Stability of ZrO₂ layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))