Skip to main navigation Skip to search Skip to main content

Etching kinetics of silicon dioxide in aqueous fluoride Solutions: A surface complexation model

  • K. Osseo-Asare

Research output: Contribution to journal › Article › peer-review

49   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'Etching kinetics of silicon dioxide in aqueous fluoride Solutions: A surface complexation model'. Together they form a unique fingerprint.
Sort by

Keyphrases

Engineering

Chemical Engineering

Material Science