Abstract
This article discusses various aspects of such a hypothetical transition, first explaining some of the deficiencies of liquid-phase cleaning and then considering possible approaches to gas-phase cleaning technology. Finally, some examples of dry-cleaning processes are presented. While these examples specifically address the dry cleaning of silicon, the article's general discussion is relevant to any semiconductor material.
Original language | English (US) |
---|---|
Pages (from-to) | 39-43 |
Number of pages | 5 |
Journal | Microcontamination |
Volume | 6 |
Issue number | 3 |
State | Published - Mar 1988 |
All Science Journal Classification (ASJC) codes
- General Engineering