TY - GEN
T1 - Evaluation of 1/f noise in prospective IR imaging thin films
AU - Basantani, Hitesh A.
AU - Saint John, David B.
AU - Podraza, Nikolas J.
AU - Jackson, Thomas N.
AU - Horn, Mark W.
PY - 2014/1/1
Y1 - 2014/1/1
N2 - Vanadium oxide (VOx) and hydrogenated silicon germanium (Si xGe1-x) are the two predominant thin film material systems used as the active layer in resistive infrared imaging. Thin films of VOx used in microbolometers have a resistivity typically between 0.1 and 1 Ω-cm with a temperature coefficient of resistance, |TCR| between 1.4%/K to 2.4%/K, while SixGe1-x:H thin films have a resistivity between 200-4,000 Ω-cm with a |TCR| between 2.9%/K to 3.9%/K. Future devices may require higher TCR materials, however, higher TCR is loosely associated with higher resistivity and therefore also with high noise. This work compares 1/f noise of high resistivity VOxand Ge:H thin films having |TCR| < 3.6%/K. The high TCR thin films of VOxwere found to be amorphous while, depending on the deposition conditions, the Ge:H thin films were either amorphous or mixed phase of amorphous + nanocrystalline. Evaluation of these VOx and Ge:H thin films indicates a prospects for a superior process-property relation of 1/f noise in Ge:H thin films in comparison with thin films of VOx.
AB - Vanadium oxide (VOx) and hydrogenated silicon germanium (Si xGe1-x) are the two predominant thin film material systems used as the active layer in resistive infrared imaging. Thin films of VOx used in microbolometers have a resistivity typically between 0.1 and 1 Ω-cm with a temperature coefficient of resistance, |TCR| between 1.4%/K to 2.4%/K, while SixGe1-x:H thin films have a resistivity between 200-4,000 Ω-cm with a |TCR| between 2.9%/K to 3.9%/K. Future devices may require higher TCR materials, however, higher TCR is loosely associated with higher resistivity and therefore also with high noise. This work compares 1/f noise of high resistivity VOxand Ge:H thin films having |TCR| < 3.6%/K. The high TCR thin films of VOxwere found to be amorphous while, depending on the deposition conditions, the Ge:H thin films were either amorphous or mixed phase of amorphous + nanocrystalline. Evaluation of these VOx and Ge:H thin films indicates a prospects for a superior process-property relation of 1/f noise in Ge:H thin films in comparison with thin films of VOx.
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U2 - 10.1117/12.2054652
DO - 10.1117/12.2054652
M3 - Conference contribution
AN - SCOPUS:84906265821
SN - 9781628410075
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Infrared Technology and Applications XL
PB - SPIE
T2 - 40th Conference on Infrared Technology and Applications
Y2 - 5 May 2014 through 8 May 2014
ER -