@inproceedings{cacbb37ae1c74fc69479e4e3d3102f97,
title = "Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness",
abstract = "The controlling factors in the formation of the compositional heterogeneity at the deprotection front were investigated using 3D computer simulation. The results illustrate that the chemical composition fluctuation (CCF) formed by the photoresist deprotection reaction is an important factor contributing to the line-edge-roughness (LER) in addition to the deprotection gradient (DG) of the reaction front. The magnitude of the chemical composition fluctuation and the deprotection gradient are found to depend on the ratio of the deprotection reaction rate constant to diffusion coefficient (k p/D) and the number of hoping step (n) With this new finding, the influence on LER from various process/material parameters such as dose/contrast, diffusivity, and reactivity can all be understood through their effects on k p/D and n.",
author = "Shuhui Kang and Wu, {Wen Li} and Prabhu, {Vivek M.} and Vogt, {Bryan D.} and Lin, {Eric K.} and Karen Turnquest",
year = "2007",
doi = "10.1117/12.712682",
language = "English (US)",
isbn = "0819466387",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
number = "PART 2",
booktitle = "Advances in Resist Materials and Processing Technology XXIV",
edition = "PART 2",
note = "Advances in Resist Materials and Processing Technology XXIV ; Conference date: 26-02-2007 Through 28-02-2007",
}