Keyphrases
AlN Buffer Layer
66%
Change of Measure
33%
Chemical Vapor Deposition Growth
100%
Film Deposition
33%
Film Stress
100%
Growth Stress
33%
Growth Temperature
33%
In-situ Test
33%
Island Coalescence
33%
Island nucleation
33%
Low Temperature
33%
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Multi-beam
33%
Sapphire
66%
Sapphire Substrate
100%
Sensor Systems
33%
Stress Relief
33%
Surface Film
100%
Surface Morphology
100%
Zero Stress
33%
Engineering
Buffer Layer
66%
Chemical Vapor Deposition
100%
Delamination
33%
Growth Temperature
33%
In Situ Stress Measurement
33%
Low-Temperature
33%
Sapphire Substrate
100%
Sensor System
33%
Stress Relief
33%
Surface Film
100%
Surface Morphology
100%
Tensiles
33%
Vapor Deposition
100%
Material Science
Aluminum Nitride
50%
Buffer Layer
50%
Chemical Vapor Deposition
100%
Delamination
25%
Film
100%
Film Deposition
25%
In Situ Stress Measurement
25%
Nucleation
25%
Sapphire
100%
Surface Morphology
100%
Thick Films
25%