Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography

M. E. Anderson, R. K. Smith, Z. J. Donhauser, A. Hatzor, P. A. Lewis, L. P. Tan, H. Tanaka, M. W. Horn, P. S. Weiss

Research output: Contribution to journalArticlepeer-review

36 Scopus citations


An overview is given on several means by which self-assembly processes can be utilized to pattern surfaces for technological applications. Hybridization of current nanofabrication techniques with selective chemical functionalization and methods are shown to be vital for the connection and application of molecular devices and also as an economical and parallel means to reach smaller scales in conventional electronic (and other) devices.

Original languageEnglish (US)
Pages (from-to)2739-2744
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
StatePublished - Nov 2002

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography'. Together they form a unique fingerprint.

Cite this