Abstract
We compare independent gate FinFETs, FinFETs with different fin orientations and asymmetric drain spacer extension FinFETs to analyze the implications of each for memory design in sub-15nm technologies. A mixed mode simulation framework based on ballistic NEGF models for FinFETs and circuit simulations in SPICE is developed for the analysis.
Original language | English (US) |
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Title of host publication | 2011 International Electron Devices Meeting, IEDM 2011 |
DOIs | |
State | Published - Dec 1 2011 |
Event | 2011 IEEE International Electron Devices Meeting, IEDM 2011 - Washington, DC, United States Duration: Dec 5 2011 → Dec 7 2011 |
Other
Other | 2011 IEEE International Electron Devices Meeting, IEDM 2011 |
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Country/Territory | United States |
City | Washington, DC |
Period | 12/5/11 → 12/7/11 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry