@inproceedings{af1adb6aed5e4efb9909a9c60186b416,
title = "Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration",
abstract = "We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40% at lower energies, with maximum single order diffraction efficiency ranging from 20-40%. Total diffraction efficiency was ≥ 30% across the entire measured band pass of 180 eV to 1300 eV.",
author = "McCurdy, {Ross C.} and McEntaffer, {Randall L.} and McCoy, {Jake A.} and Miles, {Drew M.}",
note = "Funding Information: The authors would like to thank Fabien Gris{\'e}, Chad Eichfeld, and Michael Labella for their assistance with grating fabrication, and Eric Gullikson for his support at ALS. This research used resources of the Nanofabrication Laboratory and the Materials Characterization Laboratory at the Materials Research Institute at Penn State, as well as the Advanced Light Source, which is a DOE Office of Science User Facility under contract no. DE-AC02-05CH11231. This work is supported by NASA grants 80NSSC18K0282, NNX17AD19G, and a NASA Space Technology Research Fellowship. Publisher Copyright: {\textcopyright} 2019 SPIE.; Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019 ; Conference date: 13-08-2019 Through 15-08-2019",
year = "2019",
doi = "10.1117/12.2530052",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "O'Dell, {Stephen L.} and Giovanni Pareschi",
booktitle = "Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX",
address = "United States",
}