Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

Ross C. McCurdy; Randall L. McEntaffer; Jake A. McCoy; Drew M. Miles

doi:10.1117/12.2530052

Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

Ross C. McCurdy
, Randall L. McEntaffer
, Jake A. McCoy
, Drew M. Miles

Astronomy & Astrophysics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Scopus citations

Abstract

We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40% at lower energies, with maximum single order diffraction efficiency ranging from 20-40%. Total diffraction efficiency was ≥ 30% across the entire measured band pass of 180 eV to 1300 eV.

Original language	English (US)
Title of host publication	Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX
Editors	Stephen L. O'Dell, Giovanni Pareschi
Publisher	SPIE
ISBN (Electronic)	9781510629318
DOIs	https://doi.org/10.1117/12.2530052
State	Published - 2019
Event	Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019 - San Diego, United States Duration: Aug 13 2019 → Aug 15 2019

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	11119
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019
Country/Territory	United States
City	San Diego
Period	8/13/19 → 8/15/19

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2530052

Cite this

McCurdy, R. C., McEntaffer, R. L., McCoy, J. A., & Miles, D. M. (2019). Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration. In S. L. O'Dell, & G. Pareschi (Eds.), Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX Article 111190Y (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11119). SPIE. https://doi.org/10.1117/12.2530052

McCurdy, Ross C. ; McEntaffer, Randall L. ; McCoy, Jake A. et al. / Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration. Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX. editor / Stephen L. O'Dell ; Giovanni Pareschi. SPIE, 2019. (Proceedings of SPIE - The International Society for Optical Engineering).

@inproceedings{af1adb6aed5e4efb9909a9c60186b416,

title = "Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration",

abstract = "We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40\% at lower energies, with maximum single order diffraction efficiency ranging from 20-40\%. Total diffraction efficiency was ≥ 30\% across the entire measured band pass of 180 eV to 1300 eV.",

author = "McCurdy, \{Ross C.\} and McEntaffer, \{Randall L.\} and McCoy, \{Jake A.\} and Miles, \{Drew M.\}",

note = "Publisher Copyright: {\textcopyright} 2019 SPIE.; Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019 ; Conference date: 13-08-2019 Through 15-08-2019",

year = "2019",

doi = "10.1117/12.2530052",

language = "English (US)",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "O'Dell, \{Stephen L.\} and Giovanni Pareschi",

booktitle = "Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX",

address = "United States",

}

McCurdy, RC, McEntaffer, RL, McCoy, JA & Miles, DM 2019, Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration. in SL O'Dell & G Pareschi (eds), Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX., 111190Y, Proceedings of SPIE - The International Society for Optical Engineering, vol. 11119, SPIE, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019, San Diego, United States, 8/13/19. https://doi.org/10.1117/12.2530052

Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration. / McCurdy, Ross C.; McEntaffer, Randall L.; McCoy, Jake A. et al.
Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX. ed. / Stephen L. O'Dell; Giovanni Pareschi. SPIE, 2019. 111190Y (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11119).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

AU - McCurdy, Ross C.

AU - McEntaffer, Randall L.

AU - McCoy, Jake A.

AU - Miles, Drew M.

PY - 2019

Y1 - 2019

N2 - We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40% at lower energies, with maximum single order diffraction efficiency ranging from 20-40%. Total diffraction efficiency was ≥ 30% across the entire measured band pass of 180 eV to 1300 eV.

AB - We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40% at lower energies, with maximum single order diffraction efficiency ranging from 20-40%. Total diffraction efficiency was ≥ 30% across the entire measured band pass of 180 eV to 1300 eV.

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UR - https://www.scopus.com/pages/publications/85076888136#tab=citedBy

U2 - 10.1117/12.2530052

DO - 10.1117/12.2530052

M3 - Conference contribution

AN - SCOPUS:85076888136

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX

A2 - O'Dell, Stephen L.

A2 - Pareschi, Giovanni

PB - SPIE

T2 - Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019

Y2 - 13 August 2019 through 15 August 2019

ER -

McCurdy RC, McEntaffer RL, McCoy JA, Miles DM. Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration. In O'Dell SL, Pareschi G, editors, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX. SPIE. 2019. 111190Y. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2530052

Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

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