TY - GEN
T1 - Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography
AU - Zhang, Gang
AU - Gan, Lin
AU - Yang, Bai
AU - Wang, Dayang
AU - Möhwald, Helmuth
PY - 2009
Y1 - 2009
N2 - Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.
AB - Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.
UR - http://www.scopus.com/inward/record.url?scp=77950967717&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77950967717&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:77950967717
SN - 9789810836948
T3 - 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
SP - 277
EP - 279
BT - 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
T2 - 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
Y2 - 26 July 2009 through 30 July 2009
ER -