Fabrication of strain tunable infrared frequency selective surfaces on electrostrictive poly(vinylidene fluoride-trifluoroethylene) copolymer films using a stencil mask method

Yong Hong Ye; D. Y. Jeong; Q. M. Zhang

doi:10.1063/1.1775036

Fabrication of strain tunable infrared frequency selective surfaces on electrostrictive poly(vinylidene fluoride-trifluoroethylene) copolymer films using a stencil mask method

Yong Hong Ye, D. Y. Jeong, Q. M. Zhang

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

A stencil mask method to fabricate metallic patch arrays on the electrostrictive poly(vinylidene flouride-trifluoroethylene) copolymer films was discussed. It was found that the metallic patterns were formed by evaporating metal through a stencil mask. The temperature at the substrate surface was estimated to be below 100° due to short deposition time and the long distance between the substrate and the evaporation source. The results show that the stencil flask method was useful for depositing metallic patterns on a subset of substrates.

Original language	English (US)
Pages (from-to)	654-656
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	4
DOIs	https://doi.org/10.1063/1.1775036
State	Published - Jul 26 2004

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.1775036

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title = "Fabrication of strain tunable infrared frequency selective surfaces on electrostrictive poly(vinylidene fluoride-trifluoroethylene) copolymer films using a stencil mask method",

abstract = "A stencil mask method to fabricate metallic patch arrays on the electrostrictive poly(vinylidene flouride-trifluoroethylene) copolymer films was discussed. It was found that the metallic patterns were formed by evaporating metal through a stencil mask. The temperature at the substrate surface was estimated to be below 100° due to short deposition time and the long distance between the substrate and the evaporation source. The results show that the stencil flask method was useful for depositing metallic patterns on a subset of substrates.",

author = "Ye, {Yong Hong} and Jeong, {D. Y.} and Zhang, {Q. M.}",

note = "Funding Information: The work was supported by the Penn State MRSEC Center for Nanoscale Science funded by NSF under Grant No. DMR-0080019.",

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AU - Ye, Yong Hong

AU - Jeong, D. Y.

AU - Zhang, Q. M.

N1 - Funding Information: The work was supported by the Penn State MRSEC Center for Nanoscale Science funded by NSF under Grant No. DMR-0080019.

PY - 2004/7/26

Y1 - 2004/7/26

N2 - A stencil mask method to fabricate metallic patch arrays on the electrostrictive poly(vinylidene flouride-trifluoroethylene) copolymer films was discussed. It was found that the metallic patterns were formed by evaporating metal through a stencil mask. The temperature at the substrate surface was estimated to be below 100° due to short deposition time and the long distance between the substrate and the evaporation source. The results show that the stencil flask method was useful for depositing metallic patterns on a subset of substrates.

AB - A stencil mask method to fabricate metallic patch arrays on the electrostrictive poly(vinylidene flouride-trifluoroethylene) copolymer films was discussed. It was found that the metallic patterns were formed by evaporating metal through a stencil mask. The temperature at the substrate surface was estimated to be below 100° due to short deposition time and the long distance between the substrate and the evaporation source. The results show that the stencil flask method was useful for depositing metallic patterns on a subset of substrates.

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Fabrication of strain tunable infrared frequency selective surfaces on electrostrictive poly(vinylidene fluoride-trifluoroethylene) copolymer films using a stencil mask method

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