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Film deposition on electrostatically suspended nanowires by pecvd in dusty plasma reactor
Themis Matsoukas, Jin Cao
Chemical Engineering
Research output
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Contribution to conference
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peer-review
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Dive into the research topics of 'Film deposition on electrostatically suspended nanowires by pecvd in dusty plasma reactor'. Together they form a unique fingerprint.
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Keyphrases
Nanowires
100%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Film Deposition
100%
Dusty Plasma
100%
Suspended Nanowire
100%
Plasma Reactor
100%
Deposition Rate
57%
Spherical Particles
28%
Hydrocarbons
14%
Ultra-low
14%
Reactor
14%
Airborne Particles
14%
Spatial Distribution
14%
Growth Law
14%
Spatial Inhomogeneity
14%
Linear Growth
14%
Film Thickness
14%
Batch System
14%
Suspended Particles
14%
Extended Period
14%
Submicron Particles
14%
Deposition Time
14%
Semi-batch
14%
Gold Nanowires
14%
Population Balance Model
14%
Uniform Coating
14%
Gaseous Reactants
14%
Charge-to-mass Ratio
14%
Material Science
Nanowire
100%
Film Deposition
100%
Thin Films
11%
Film Thickness
11%
Carbon Films
11%
Amorphous Hydrogenated Carbon
11%
Chemical Engineering
Deposition Rate
44%
Plasma Enhanced Chemical Vapor Deposition
11%
Population Balance
11%